Nanoscale Precision in Membrane Design: A Mini Review on Atomic Layer Deposition for Functional Modifications

Abstract

Membrane-based separation technology has grown significantly due to its cost-effectiveness, energy efficiency, easy system operations, and scale-up. The versatility of membrane application is also a significant factor in their widespread use in many separation processes. Their applications span water treatment, gas purification, energy production, and biomedicine. While promising, membrane technology still requires improvements in membrane features and performance, such as pore structure, fouling resistance, chemical stability, and concurrent enhancement of permeability and selectivity. Atomic Layer Deposition (ALD) has emerged as a powerful tool for enhancing membrane properties and performance through surface modification with atomic-scale precision, enabling conformal coatings, functional surface modification, and precise control over pore size. The ability of ALD to deposit uniform and conformal films on membrane substrates makes it a favourable modification technique. This review offers a concise yet informative discussion on the fundamentals of ALD, its integration with membrane modification, recent advancements in ALD-modified membranes, emerging trends in membrane modification via ALD, and challenges of ALD application in membrane modification.